Abstract
Using methods for measuring photocurrent and Raman scattering spectra the surface region microstructure of the silicon photovoltaic converter with n+—p junction and an antireflective porous silicon film is studied. The n+—p junction is formed by thermal diffusion of phosphorus from a porous film. It is found that high-temperature treatment during diffusion results in coarsening silicon crystallites and a decrease in the defect density in the porous silicon film. It is noted that the n+ —p junction is formed within the largest crystallites of the porous silicon film.
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Russian Text © N.N. Mel’nik, V.L. Fedorov, V.V. Tregulov, 2019, published in Kratkie Soobshcheniya po Fizike, 2019, Vol. 46, No. 1, pp. 23–29.
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Mel’nik, N.N., Fedorov, V.L. & Tregulov, V.V. Study of Microstructure Features of the Surface Region of the Photovoltaic Converter with an Antireflective Porous Silicon Film and an n+—p Junction. Bull. Lebedev Phys. Inst. 46, 36–39 (2019). https://doi.org/10.3103/S1068335619010111
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DOI: https://doi.org/10.3103/S1068335619010111