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Accumulation of Deuterium and Helium in Co-Deposited W Layers Formed in He-Seeded Deuterium Plasma

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Bulletin of the Russian Academy of Sciences: Physics Aims and scope

Abstract

The effect He in plasma has on the co-deposition of D–W films is investigated for the room–800 K range of substrate temperatures and two He/D2 ratios of 5 and 20%. He can both raise and lower the content of D in a film, and a mechanism is proposed for this effect. The ratio of He/D in the film is higher than in gas, due to the stronger diffusivity and bonding energy of He. A similarity is observed between the dependences of D and He content on temperature, and it is suggested that the low temperature release of D and He during TDS could be due to annealing-induced relaxation of stresses in the film structure. It is expected that the desorption of He above 1300 K could lead to underestimates of the He content.

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FUNDING

This work was supported by the Russian Science Foundation, project no. 17-72-20191.

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Authors and Affiliations

  1. Moscow Engineering Physics Institute (MEPhI), 115409, Moscow, Russia

    S. A. Krat, E. A. Fefelova, A. S. Prishvitsyn, A. K. Khomyakov, Yu. M. Gasparyan & A. A. Pisarev

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  1. S. A. Krat
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  2. E. A. Fefelova
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  3. A. S. Prishvitsyn
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  4. A. K. Khomyakov
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  5. Yu. M. Gasparyan
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  6. A. A. Pisarev
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Corresponding author

Correspondence to E. A. Fefelova.

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The authors declare they have no conflicts of interest.

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Translated by E. Baldina

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Krat, S.A., Fefelova, E.A., Prishvitsyn, A.S. et al. Accumulation of Deuterium and Helium in Co-Deposited W Layers Formed in He-Seeded Deuterium Plasma. Bull. Russ. Acad. Sci. Phys. 86, 521–525 (2022). https://doi.org/10.3103/S1062873822050148

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  • DOI: https://doi.org/10.3103/S1062873822050148

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