Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Nano-Patterning for Patterned Media using Block-Copolymer
Koji AsakawaToshiro HiraokaHiroyuki HiedaMasatoshi SakuraiYoshiyuki KamataKatsuyuki Naito
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2002 Volume 15 Issue 3 Pages 465-470

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Abstract

Block-copolymers are known to generate nano-scale microdomains by microphase-separation, if they are annealed at a temperature lower than their order-disorder transition temperatures. We tried to transfer microdomains onto substrates by only using the reactive-ion etching method, which is widely used in semiconductor manufacturing processes.
Block-copolymers consisting of an aromatic polymer and an acrylic polymer were used since there is a big difference in the dry-etch resistance, and nanometer-scale dot patterns can be easily obtained on the substrates.
Regarding the application of this nano-patterning technique, we demonstrated the first circumferential magnetic patterned media for hard disk, which were prepared on a 2.5-inch diameter glass plate.

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© The Technical Association of Photopolymers, Japan
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