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Vapor-liquid-solid Growth of III-Nitride Nanowires and Heterostructures by Metal-Organic Chemical Vapor Deposition

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Abstract

We report flexible synthesis of III-Nitride nanowires and heterostructures by metal-organic chemical vapor deposition (MOCVD) via a catalytic vapor-liquid-solid (VLS) growth mechanism. Indium is used as an in-situ catalyst to facilitate and sustain the stability of liquid phase droplet for VLS growth based on thermodynamic consideration. The employment of mesoporous molecular sieves (MCM-41) helps to prevent the coalescence of catalyst droplets and to promote nucleation statistics. Cathodoluminescence (CL) of GaN nanowires shows near band-edge emission at 370nm, and strong E2 phonon peak is observed at room temperature in Raman scattering spectra. Both binary GaN and AlN nanowires have been synthesized by MOCVD. Three-dimensional AlN/GaN trunk-branch nanostructures are reported to illustrate the versatility of incorporating the VLS mechanism into MOCVD process.

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Acknowledgments

Discussion with and assistance from G. Cheng, A. Sanders, I. Kretzschmar, R. Munden, E. Stern, and M. A. Reed, is acknowledged. The authors acknowledge support by DOE and NSF.

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Su, J., Gherasimova, M., Cui, G. et al. Vapor-liquid-solid Growth of III-Nitride Nanowires and Heterostructures by Metal-Organic Chemical Vapor Deposition. MRS Online Proceedings Library 831, 248–253 (2004). https://doi.org/10.1557/PROC-831-E12.4

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  • DOI: https://doi.org/10.1557/PROC-831-E12.4

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