Abstract
Thin films composed of MgF2 and TiO2 were grown by glancing flux incidence, where the physical vapor flux arrives at the substrate between 80° and 90° with respect to substrate normal. The resulting films are composed of slanted columns inclined toward the incoming flux. The films were modeled using the Bruggemann effective medium approximation (EMA) and were found to be biaxial with one of the principal indices of refraction along the direction of the posts. The indices of refraction for MgF2 and TiO2 films were found to be in the range of 1.06 to 1.2 and 1.36 to 1.62, respectively, at a wavelength of 600 nm. The indices of refraction were found to decrease as the deposition angle increased. The film density was also found to be independent of the film thickness for films ranging in thickness from 500 nm to 3400 nm.
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Acknowledgments
The authors would like to express thanks to George Braybrook for his excellent SEM work, the people at J. A. Woollam for their assistance with miscellaneous ellipsometer questions, to Andy van Popta for numerous discussions, and to the J Gordin Kaplan Graduate Student Award for travel assistance. NSERC and iCORE are thanked for financial support.
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Gospodyn, J., Brett, M.J. & Sit, J.C. Characterization By Variable Angle Spectroscopic Ellipsometry Of Dielectric Columnar Thin Films Produced By Glancing Angle Deposition. MRS Online Proceedings Library 797, 134–139 (2003). https://doi.org/10.1557/PROC-797-W5.19
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DOI: https://doi.org/10.1557/PROC-797-W5.19