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Selective Area Chemical Vapor Deposition of Chromium Oxides

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Abstract

We demonstrate that two-phase CrO2 and Cr2O3 thin films can be grown by using selective organometallic chemical vapor deposition through the oxidation of Cr(CO)6 in an oxygen environment. While the magnetization measurements show that both chromium oxides are present, the relative weight of each phase depends on the oxygen partial pressure. Changes of the Curie temperature, Tc and the saturation magnetization field may be possible by controlling the stoichiometry.

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Authors and Affiliations

  1. Department of Physics and Astronomy and the Center for Materials Research and Analysis (CMRA), Behlen Laboratory of Physics, University of Nebraska-Lincoln, NE, 68588-0111, USA

    Ruihua Cheng & C. N. Borca

  2. Department of Physics and Astronomy and the Center for Materials Research and Analysis (CMRA), Behlen Laboratory of Physics, University of Nebraska-Lincoln, NE, 68588-0111, USA

    P. A. Dowben

Authors
  1. Ruihua Cheng
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  2. C. N. Borca
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  3. P. A. Dowben
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Correspondence to P. A. Dowben.

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Cheng, R., Borca, C.N. & Dowben, P.A. Selective Area Chemical Vapor Deposition of Chromium Oxides. MRS Online Proceedings Library 614, 1041 (2000). https://doi.org/10.1557/PROC-614-F10.4.1

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  • DOI: https://doi.org/10.1557/PROC-614-F10.4.1

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