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Composition Control of Lead Or Bismuth Based Ferroelectric Thin Films Prepared by Sputtering Method

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Composition control in lead or bismuth based ferroelectric thin films was studied for rf magnetron, dc magnetron and ion beam sputter depositions with metal or oxide targets For room temperature depositions, (1) control of the target surfaces, (2) suppression of harmful effects from negative ions and (3) control of oxygen content in the films were significant. The surface of the lead target gradually degrades and alters the lead flux extracted from the target. At low pressures resputtering from the film occurs by negative oxygen ions. It is necessary to put more oxygen into the films in the sputter depositions with metal targets and the ion beam sputter depositions For high temperature depositions, a composition self control was observed for films deposited in excess lead environments.

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Authors and Affiliations

  1. Intercollege Materials Research Laboratory, The Pennsylvania State University, University Park, PA, 16802, USA

    K. Yamakawa, S. Trolier-Mckinstry & J.P. Dougherty

Authors
  1. K. Yamakawa
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  2. S. Trolier-Mckinstry
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  3. J.P. Dougherty
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Yamakawa, K., Trolier-Mckinstry, S. & Dougherty, J. Composition Control of Lead Or Bismuth Based Ferroelectric Thin Films Prepared by Sputtering Method. MRS Online Proceedings Library 403, 591–596 (1995). https://doi.org/10.1557/PROC-403-591

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  • DOI: https://doi.org/10.1557/PROC-403-591

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