Abstract
The technique of external reflection infrared (IR) spectroscopy is used to study silicon surface chemistry. External reflection is enhanced by implanting a buried cobalt silicide layer in silicon to act as an infrared reflector. The preparation of clean well-ordered surfaces from the ion implanted substrates is demonstrated. The reactions of water and ethanol with Si(100) are investigated.
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Struck, L.M., Eng, J., Bent, B.E. et al. Silicon Surface Chemistry By IR Spectroscopy in the Mid- To Far-IR Region: H2O And Ethanol On Si(100). MRS Online Proceedings Library 386, 395–400 (1995). https://doi.org/10.1557/PROC-386-395
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DOI: https://doi.org/10.1557/PROC-386-395