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Solid State Reaction of Sputter Deposited Crystalline Multilayers of Ni and Zr

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Abstract

We have prepared sputtered metallic films comprised of alternating layers of pure Ni and Zr to a total thickness of several microns. Due to the negative beat of mixing of crystalline Ni and Zr and a significant intermixing rate we have been able to form an amorphous Ni-Zr phase by a solid state reaction. In this work we report the conditions under which a substantial fraction of amorphous material may be formed. The extent of the reaction itself as a function of time has also been monitored.

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Authors and Affiliations

  1. W. M. KECK Laboratory for Engineering Materials, California Institute of Technology, Pasadena, CA, 91125, USA

    K. M. Unruh, W. J. Meng & W. L. Johnson

  2. Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA, 91109, USA

    A. P. Thakoor & S. K. Khanna

Authors
  1. K. M. Unruh
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  2. W. J. Meng
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  3. W. L. Johnson
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  4. A. P. Thakoor
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  5. S. K. Khanna
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Additional information

This work is supported under a President’s Fund Grant from the California Institute of Technology.

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Unruh, K.M., Meng, W.J., Johnson, W.L. et al. Solid State Reaction of Sputter Deposited Crystalline Multilayers of Ni and Zr. MRS Online Proceedings Library 37, 551–557 (1984). https://doi.org/10.1557/PROC-37-551

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  • DOI: https://doi.org/10.1557/PROC-37-551

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