Abstract
Ion beam mixing is used to produce more uniform Au. Au-Ge and Au-Ge-Ni reacted contacts to GaAs.
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N. Braslau, J.B. Gunn and J.L. Staples, Solid-State Electron., 10, 381 (1967).
J. Gyulai, J.W. Mayer, V. Rodriguez, A.Y.C. Yu and H.J. Gopen. J. Appl. Phys., 42, 3578 (1971).
C.J. Palmstrom. D.V. Moraan and M.J. Howes. Nucl. Inst. and Meth. 150, 305 (1978).
R. Rosenberg. M.J. Sullivan and J.K. Howard, in Thin Films: Interdiffusion and Reaction, J.M. Poate, K.N. Tu and J.W. Mayer Eds., (Wiley-Interscience, N.Y., 1978). p 13.
L.S. Hung. J.W. Mayer. M. Zhang and E.D. Wolf. Appl. Phys. Lett. 43, 1123 (1983).
T. Inada, H. Kakinuma, A. Shirota. J. Matsumoto, M. Ishikiriyama and Y. Funaki, Proc. Ion Beam Modification of Materials 1984 (to be published).
K. Tsutsui and S. Furukawa, J. Appl. Phys., 56, 560 (1984).
S. Smith and J. Solomon. private communication.
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Palmrøm, C.J., Kavanagh, K.L., Hollis, M.J. et al. Improved Uniformity of Reacted GaAs Contacts by Interface Mixing. MRS Online Proceedings Library 37, 473–478 (1984). https://doi.org/10.1557/PROC-37-473
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DOI: https://doi.org/10.1557/PROC-37-473