Abstract
Hydrogen is a common impurity in silicon dioxide (SiO2) which can influence its optical and electronic properites. Here, nuclear magnetic resonance (NMR) is applied to study of hydrogen in these materials, despite their relatively low hydrogen content. We present results for bulk fused silica as well as thermally grown films of SiO2 on silicon. These experiments demonstrate the potential of solid state NMR for studying low hydrogen content film systems. In bulk fused silica, we have observed that although the majority of hydrogen is isolated, a small number of centers exist involving adjacent silanol pairs. These pairs react during high temperature annealing as well as during deep ultraviolet irradiation. Furthermore, the presence of these centers is related to the susceptibility of fused silica to radiation damage. The results obtained on the fused silica material are compared to SiO2 films on silicon. The NMR spectra and relaxation associated with thick (>1μm) wet SiO2 films are similar to those for the fused silica while the NMR data for thinner oxide more closely resembles those of surface water on silica gel.
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References
R. W. Lee,. Phys. Chem. Glasses 5, 35 (1964).
A. J. Moulson and J. P. Roberts, Trans. Faraday Soc. 57, 1208 (1961).
G. E. Walrafen and S. R. Samanta, J. Chem. Phys. 69(1), 493 (1978).
M. Rothschild, D. J. Ehrlich and D. C. Shaver, Appl. Phys. Lett. 55, 1276 (1989).
D. L. Griscom, M. Stapelbroeck, and E. J. Friebele, J. Chem. Phys 78, 1638 (1983).
E. A. Irene, J. Electrochem. Soc., 125, 1708 (1979).
V. K. Samalam, Appl. Phys. Lett., 47, 736 (1985).
A. G. Revesz, J. Electrochem. Soc., 126, 122 (1979).
V. Lakshmanna, A. S. Vengurlekar, and K. V. Ramanathan, J. Appl. Phys., 62, 2337 (1987).
E.H. Poindexter and P.J. Caplan, Prog. Surf. Sci. 14, 201 (1983).
M. L. Reed and J. D. Plummer, Appl. Phys. Lett., 51, 514, (1987).
M. L. Reed and J. D. Plummer, J. Appl. Phys., 63, 5776 (1988).
M. A. Briere and D. Braunig, IEEE Trans. Nuc. Sci., 37, 1658 (1990).
A. D. Marwick and D. R. Young, J. Appl. Phys., 63, 2291 (1988).
I. S. T. Tsong, M. D. Monkowski, J. R. Monkowski, P. D. Miller, C. D. Moak, B. R. Appleton, and A. L. Wintenberg, “Investigation of Hydrogen and Chlorine at the Si/SiO2 Interface”, from The Preparation of MPS Insulators, Lucovsky ed. (1980).
C. W. Magee and E. M. Botnick, J. Vac. Sci. Technol., 19, 47 (1981).
H. Shanks, C. J. Fang, L. Ley, M. Cardona, F. J. Demond, S. Kalbitzer, Phys. Stat. Sol. (b), 100, 43 (1980).
K. H. Beckman and N. J. Harrick, J. Electrochem. Soc., 118, 614 (1971).
R. F. Bartholomew and J. W. H. Schreurs, J. Noncryst. Solids, 38–39, 679 (1980).
H. Eckert, J. P. Yesinowski, L. A. Silver, and E. M. Stolper, J. Phys. Chem., 92, 2055 (1988).
D. H. Levy, K.K Gleason, M. Rothschild, J. H. C. Sedlacek, Appl. Phys. Lett., 60, 1667 (1992).
F. Hanus and P. Gillis, J. Mag. Res., 59, 437 (1984).
J. R. Zimmerman, B. G. Holmes, and J. A. Lasater, J. Phys. Chem., 60, 1157 (1956).
D. H. Levy and K. K. Gleason, J. Vac. Sci. and Technol.A, in press.
T. C. Farrar and E. D. Becker, Pulse and Fourier Transform NMR: Introduction to Theory and Methods (Academic Press, New York, 1971), p. 25
M. S. Conradi and R. E. Norberg, Phys. Rev. B 24, 2285 (1981).
A. Abragam, Principles of Nuclear Magnetism, (Oxford Univ. Press, Oxford, 1961).
B. C. Bunker, D. R. Tallant, T. J. Headley, G. L. Turner, and R. J. Kirkpatrick, Phys. Chem. Glasses 29, 106 (1988).
R. A. B. Devine and J. Arndt, Phys. Rev. B 39(8), 5132 (1989).
M. Stapelbroeck, D. L. Griscom, E. J. Friebele, and G. H. Sigel, Jr., J. Non-Cryst. Solids 32, 313 (1979).
D.H. Levy, K.K. Gleason, M. Rothchild, and J.H. Sedlacek, J. Appl. Phys. submitted.
P. J. Burkhardt, J. Electrochem. Soc., 114, 196 (1967).
Acknowledgements
We acknowledge the support of the National Science Foundation through grant No. DMR 8918834. We thank Dr. Mordy Rothschild and Jan Sedlacek of Lincoln Lab for the excimer laser irradiations and optical measurements and Dr. Rolf Takke of Heraeus Quartzglas for supplying the fused silica samples.
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Levy, D.H., Gleason, K.K. Detection of Hydrogen in Bulk and Thin Film Silicon Dioxide by Hydrogen Nuclear Magnetic Resonance. MRS Online Proceedings Library 284, 259–264 (1992). https://doi.org/10.1557/PROC-284-259
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DOI: https://doi.org/10.1557/PROC-284-259