Abstract
Picosecond ultrasonics is employed to study the titanium silicide formation sequence for evaporated Ti films on silicon substrates annealed at temperatures between 300 and 800 °C. The measurements show significant differences in the ultrasonic echo pattern before and after the structural phases C49 and C54 are formed, thus indicating that picosecond ultrasonics is a sensitive non-destructive probe of silicide formation. The longitudinal sound velocity has been found to be (8.3 ± 0.2) × 105 cm/sec for C49 TiSi2, and about 5% lower for the C54 phase.
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Acknowledgments
We acknowledge J. Tauc for valuable discussions. We thank T. R. Kirst for technical assistance. This work was supported by the U. S. Department of Energy through Grant No. DE-FG02-86ER45267.
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Lin, H.N., Stoner, R.J., Maris, H.J. et al. Detection of Titanium Silicide Formation and Phase Transformation by Picosecond Ultrasonics. MRS Online Proceedings Library 260, 221–226 (1992). https://doi.org/10.1557/PROC-260-221
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DOI: https://doi.org/10.1557/PROC-260-221