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Nucleation and Growth of Quasicrystalline Silicon Thin Films on Glass Substrate Synthesized by Ceramics Hot Wire Chemical Vapor Deposition

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In this work, we report on nucleation and growth of polycrystalline silicon thin-film on glass substrate synthesized by ceramics hot wire chemical vapor deposition. We observed perfect geometrical patterns at the surface topography of these films, i.e. “five-fold” symmetry and “sixfold” symmetry. We found “confinement of heat and photon” is a new technique in developing silicon thin-film with novel structure, i.e. quasicrystalline silicon thin-film on glass substrate. The influence of photons emitted from the hot filament on fast nucleation of nanocrystal silicon on glass substrate has been discussed.

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Middya, A.R., Liang, JJ. & Ghosh, K. Nucleation and Growth of Quasicrystalline Silicon Thin Films on Glass Substrate Synthesized by Ceramics Hot Wire Chemical Vapor Deposition. MRS Online Proceedings Library 910, 809 (2005). https://doi.org/10.1557/PROC-0910-A08-09

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  • DOI: https://doi.org/10.1557/PROC-0910-A08-09

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