Abstract
A review is presented of the development of in situ high-resolution transmission electron microscopy (HRTEM) and its application to directly study the atomic behavior in thermally activated material reactions. Not only are the atomic re-arrangements continuously recorded, but kinetic measurements can be made at controlled elevated temperatures. Examples include work on the atomic motion on CdTe surface ledges, solid phase epitaxial regrowth of silicon, crystallization of amorphous silicon and of amorphous tantalum oxide thin films, solid-state amorphization at metal-silicon interfaces, metal-induced crystallization of amorphous silicon, germanium and carbon, phase separation and crystallization in hafnium silicate thin films, and “spiking” across thin gate oxides separating nickel silicide from a monocrystalline silicon substrate. The future prospects of in situ HRTEM are discussed, and the increasing breadth of application of this approach is recognized, especially in light of the advances in HRTEM capabilities.
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Acknowledgments
The author would like to thank the Materials Research Society and his nominators for the honor of presenting the Turnbull lecture. The work described has been carried out by a series of graduate research students and some postdoctoral researchers in his group, and none of this would have been possible without their individual and collective hard work, perseverance, and ingenuity. A selection of in situ work has been cited herein, but many others made notable contributions, both directly and indirectly. The author would also like to thank Sang Chul Lee for considerable assistance in assembling this article.
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This article is based on the David Turnbull Lectureship Award given by Robert Sinclair at the 2012 MRS Fall Meeting in Boston.
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Sinclair, R. In situ high-resolution transmission electron microscopy of material reactions. MRS Bulletin 38, 1065–1071 (2013). https://doi.org/10.1557/mrs.2013.285
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DOI: https://doi.org/10.1557/mrs.2013.285