Abstract
Gallium–indium–oxide films (GaxIn2⊟xO3), where x = 0.0–1.1, were grown by low-pressure metalorganic chemical vapor deposition using the volatile metalorganic precursors In(dpm)3 and Ga(dpm)3 (dpm = 2,2,6,6-tetramethyl-3,5-heptanedionato). The films were smooth (root mean square roughness = 50–65 Å) with a homogeneously Ga-substituted, cubic In2O3 microstructure, randomly oriented on quartz or heteroepitaxial on (100) yttria-stabilized zirconia single-crystal substrates. The highest conductivity of the as-grown films was found at x = 0.12, with σ = 700 S/cm [n-type; carrier density = 8.1 × 1019 cm⊟3; mobility = 55.2 cm2/(V s); dσ/dT<0]. The optical transmission window of such films is considerably broader than that of Sn-doped In2O3, and the absolute transparency rival or exceeds that of the most transparent conductive oxides known. Reductive annealing, carried out at 400–425 C° in a flowing gas mixture of H2 (4%) and N2, resulted in increased conductivity (σ 1400 S/cm; n-type), carrier density (1.4 × 1020 cm⊟3), and mobility as high as 64.6 cm2/(V s), with little loss in optical transparency. No significant difference in carrier mobility or conductivity is observed between randomly oriented and heteroepitaxial films, arguing in combination with other data that carrier scattering effects at high-angle grain/domain boundaries play a minor role in the conductivity mechanism.
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References
D.S. Ginley and C. Bright, Eds., MRS Bull. 25, 15 (2000) and articles therein.
C.G. Granqvist, Appl. Phys. A 52, 83 (1991).
Z.M. Jarzebski, Phys. Status Solidi A 71, 13 (1982).
R. Wang, A.W. Sleight, R. Platzer, and J.A. Gardner, J. Solid State Chem. 122, 166 (1996).
R. Wang, L.H. King, and A.W. Sleight, J. Mater. Res. 11, 1659(1996).
T. Minami, T. Kakumu, and S. Takata, J. Vac. Sci. Technol., A 14, 1704 (1996).
T. Minami, T. Kakumu, K. Shimokawa, and S. Takata, Thin Solid Films 317, 318 (1998).
T. Omata, N. Ueda, N. Hikuma, K. Ueda, H. Mizoguchi, T. Hashimoto, and H. Kawazoe, Appl. Phys. Lett. 62, 499 (1993).
G.B. Palmer, K.R. Poeppelmeier, and T.O. Mason, Chem. Mater. 9, 3121 (1997).
D.D. Edwards, T.O. Mason, W. Sinkler, L.D. Marks, K.R. Poeppelmeier, Z. Hu, and J.D. Jorgensen, J. Solid State Chem. 150, 294 (2000).
D.D. Edwards and T.O. Mason, J. Am. Ceram. Soc. 81, 3285 (1998).
D.D. Edwards, T.O. Mason, W. Sinkler, L.D. Marks, F. Goutenoire, and K.R. Poeppelmeier, J. Solid State Chem. 140, 242 (1998).
D.D. Edwards, T.O. Mason, F. Goutenoire, and K.R. Poeppelmeier, Appl. Phys. Lett. 70, 1706 (1997).
D.D. Edwards, P.E. Folkins, and T.O. Mason, J. Am. Ceram. Soc. 80, 253 (1997).
J.M. Phillips, R.J. Cava, G.A. Thomas, S.A. Carter, J. Kwo, T. Siegrist, J.J. Krajewski, J.H. Marshall, W.F. Peck Jr., and D.H. Rapkine, Appl. Phys. Lett. 67, 2246 (1995).
J.M. Phillips, J. Kwo, G.A. Thomas, S.A. Carter, R.J. Cava, S.Y. Huo, J.J. Krajewski Jr., J.H. Marshall, W.F. Peck, D.H. Rapkine, and R.B. van Dover, Appl. Phys. Lett. 65, 115 (1994).
R.J. Cava, J.M. Phillips, J. Kwo, G.A. Thomas, S.A. Carter, J.J. Krajewski, W.F. Peck Jr., J.H. Marshall, and D.H. Rapkine, Appl. Phys. Lett. 64, 2071 (1994).
T. Minami, S. Takata, and T.J. Kakumu, J. Vac. Sci. Technol., A 14, 1689 (1996).
T. Minami, Y. Takeda, T. Kakumu, S. Takata, and I. Fukuda, J. Vac. Sci. Technol., A 15, 958 (1997).
R.G. Gordon, MRS Bull. 25, 52 (2000).
R.L. Weiher, J. Appl. Phys. 33, 2834 (1962).
R. Groth, Phys. Status Solidi 14, 69 (1966).
M. Kamei, T. Yagami, S. Takaki, and Y. Shigesato, Appl. Phys. Lett. 64, 2712 (1994).
E.J. Tarsa, J.H. English, and J.S. Speck, Appl. Phys. Lett. 62, 2332 (1993).
M. Kamei, Y. Shigesato, I. Yasui, N. Taga, and S. Takaki, J. NonCryst. Solids 218, 267 (1997).
N. Taga, H. Odaka, Y. Shigesato, I. Yasui, M. Kamei, and T.E. Haynes, J. Appl. Phys. 80, 978 (1996).
H.S. Kwok, X.W. Sun, and D.H. Kim, Thin Solid Films 335, 299 (1998).
H. Ohta, M. Orita, M. Hirano, H. Tanji, H. Kawazoe, and H. Hosono, Appl. Phys. Lett. 76, 2740 (2000).
M. Yan, M. Lane, C.R. Kannewurf, and R.P.H. Chang, Appl. Phys. Lett. 78, 2342 (2001).
D.L. Schulz and T.J. Marks, in CVD of Non-Metals, edited by W.S. Rees Jr., (VCH Publishers, New York, 1996), pp. 39–150.
A. Wang, J.Y. Dai, J.Z. Cheng, M.P. Chudzik, T.J. Marks, R.P.H. Chang, and C.R. Kannewurf, Appl. Phys. Lett. 73, 327 (1998).
A. Wang, J.R. Babcock, N.L. Edleman, A.W. Metz, M.A. Lane, R. Asahi, V.P. Dravid, C.R. Kannewurf, A.J. Freeman, and T.J. Marks, Proc. Nat. Acad. Sci. U.S.A. 98, 7113 (2001).
Reported in part: A. Wang, N.L. Edleman, J.R. Babcock, T.J. Marks, M.A. Lane, P.W. Brazis, and C.R. Kannewurf, in Infrared Applications of Semiconductors III, edited by B.J.H. Stadler, M.O. Manasreh, I. Ferguson, and Y-H. Zhang (Mater. Res. Soc. Symp. Proc. 607, Warrendale, PA, 2000), p. 345.
A. Wang, S.C. Cheng, J.A. Belot, R.J. McNeely, J. Cheng, B. Marcordes, and T.J. Marks, in Chemical Aspects of Electronic Ceramics Processing, edited by P.N. Kumta, A.F. Hepp, D.B. Beach, B. Arkles, and J.J. Sullivan (Mater. Res. Soc. Symp. Proc. 495, Warrendale, PA, 1998), p. 3.
R.B.H. Tahar, T. Ban, Y. Ohya, and Y.J. Takahashi, Appl. Phys. 83, 2631 (1998).
T.O. Mason, G.B. Gonzalez, D.R. Kammler, N. Mansourian-Hadavi, and B.J. Ingram, Thin Solid Films 411, 106 (2002).
L.A. Ryabova, V.S. Salun, and L.A. Serbinov, Thin Solid Films 92, 327 (1982).
E. Burstein, Phys. Rev. 93, 632 (1954).
K.L. Chopra, S. Major, and D.K. Pandya, Thin Solid Films 102, 1 (1983).
M. Marezio, Acta Crystallogr. 20, 723 (1966).
J. Cui, A. Wang, N.L. Edleman, J. Ni, P. Lee, N.R. Armstrong, and T.J. Marks, Adv. Mater. 13, 1476 (2001).
D.J. Milliron, I.G. Hill, C. Shen, A. Kahn, and J. Schwartz, J. Appl. Phys. 87, 572 (2000).
H. Ishii, K. Sugiyama, E. Ito, and K. Seti, Adv. Mater. 11, 605 (1999).
R.B.H. Tahar, T. Ban, Y. Ohya, and Y.J. Takahashi, Appl. Phys. 82, 865 (1997).
D.H. Zhang and H.L. Ma, Appl. Phys. A 62, 487 (1996).
Y. Shigesato and D.C. Paine, Appl. Phys. Lett. 62, 1268 (1993).
A. Wang, N.L. Edleman, J.R. Babcock, T.J. Marks, M.A. Lane, P.W. Brazis, and C.R. Kannewurf (manuscript in preparation).
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Wang, A., Edleman, N.L., Babcock, J.R. et al. Growth, microstructure, charge transport, and transparency of random polycrystalline and heteroepitaxial metalorganic chemical vapor deposition-derived gallium-indium-oxide thin films. Journal of Materials Research 17, 3155–3162 (2002). https://doi.org/10.1557/JMR.2002.0456
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DOI: https://doi.org/10.1557/JMR.2002.0456