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Surface stress model for intrinsic stresses in thin films

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Abstract

A simple model was presented for intrinsic stress generation in thin films resulting from surface stress effects. This mechanism can explain the origin of compressive stresses often observed during island growth prior to coalescence, as well as intrinsic compressive stresses reported for certain continuous, fully grown films. In some cases, surface stress effects may contribute to a sudden change in the intrinsic stress during island coalescence.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland, 21218, USA

    R. C. Cammarata & T. M. Trimble

  2. Department of Physics and Astronomy, University of Maryland, College Park, Maryland, 20742, USA

    R. C. Cammarata & T. M. Trimble

  3. Princeton Materials Institute and Department of Mechanical and Aerospace Engineering, Princeton University, Princeton, New Jersey, 08544, USA

    D. J. Srolovitz

Authors
  1. R. C. Cammarata
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  2. T. M. Trimble
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  3. D. J. Srolovitz
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Cammarata, R.C., Trimble, T.M. & Srolovitz, D.J. Surface stress model for intrinsic stresses in thin films. Journal of Materials Research 15, 2468–2474 (2000). https://doi.org/10.1557/JMR.2000.0354

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  • DOI: https://doi.org/10.1557/JMR.2000.0354

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