電気学会論文誌A(基礎・材料・共通部門誌)
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
論文
RFプラズマCVD法による窒化ホウ素膜の堆積
稲尾 拓朗熊懐 正彦佐藤 孝紀吉野 正樹伊藤 秀範
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2014 年 134 巻 6 号 p. 397-401

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Recently, as a great demand for high-strength and high-hardness materials is rising, improvement in performance of tools which manufacture those materials is being needed. Generally, tools to manufacture such materials are given high-hardness coating. Diamond and DLC (diamond like carbon) film are regarded as typical high-hardness materials, though, they can't be given to iron tools because carbons contained in them have high reactivity to iron. Consequently, the boron-nitride film which doesn't contain any carbons is expected as a coating material which can be adapted to iron tools. In this research, we prepared boron-nitride thin films on Si substrate using RF plasma CVD (chemical vapor deposition) method apparatus with a gas mixture of argon, nitrogen and trimethylborate (TMB: B(OCH3)3).

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