Abstract
A differential evolution algorithm (DEA) is shown to improve the design of phase-only pupil plane masks for imaging in the presence of a high-intensity point source. Strehl and suppression ratio metrics for various phase basis functions were experimentally and numerically calculated. Experiments performed with a spatial light modulator demonstrated 100 times suppression of the peak intensity. The Strehl ratio was found to be higher for the DEA masks compared to the individual phase basis function.
© 2018 Optical Society of America
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