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Publicly Available Published by De Gruyter January 1, 2009

Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR

  • Yi-Kang Pu , Zhi-Gang Guo , Zheng-De Kang , Jie Ma , Zhi-Cheng Guan , Guang-Yu Zhang and En-Ge Wang

Abstract

Emission spectroscopy is used to investigate the effect of inert gas mixing in nitrogen plasmas generated in inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) plasma sources. Vacuum ultraviolet (VUV) emission of resonance lines is used to determine concentration of atomic nitrogen while electron temperature is obtained from optical emission spectra. It is found that electron temperature can be either raised or reduced effectively by mixing helium or argon in a nitrogen discharge. Electron-electron collisions and superelastic collisions involving metastable species are key factors in electron temperature tuning.


Conference

International Symposium on Plasma Chemistry, International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, 15th, Orléans, France, 2001-07-09–2001-07-13


Published Online: 2009-01-01
Published in Print: 2002-01-01

© 2013 Walter de Gruyter GmbH, Berlin/Boston

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