Skip to main content

A 3D Simulation Based Study of Surface Potential for Cylindrical Gate (CG) MOSFETs

Buy Article:

$107.14 + tax (Refund Policy)

Device scaling increases the circuit performance and number of components per chip, but due to scaling Short Channel Effects (SCEs) and Drain Induced Barrier Lowering (DIBL) arises and degrades the device performance. To overcome above mentioned degradation in device performance, multiple gate structure (double, triple and gate all around) have been proposed as an alternative of planar CMOS. To validate the proposed structure performance, a 3D simulation is carried out on the commercially available ATLAS, a 3D device simulator from SILVACO.

Keywords: ATLAS; CGMOSFETS; DIBL; SCES; TMSG

Document Type: Research Article

Publication date: 01 October 2015

More about this publication?
  • Journal of Nanoelectronics and Optoelectronics (JNO) is an international and cross-disciplinary peer reviewed journal to consolidate emerging experimental and theoretical research activities in the areas of nanoscale electronic and optoelectronic materials and devices into a single and unique reference source. JNO aims to facilitate the dissemination of interdisciplinary research results in the inter-related and converging fields of nanoelectronics and optoelectronics.
  • Editorial Board
  • Information for Authors
  • Subscribe to this Title
  • Ingenta Connect is not responsible for the content or availability of external websites
  • Access Key
  • Free content
  • Partial Free content
  • New content
  • Open access content
  • Partial Open access content
  • Subscribed content
  • Partial Subscribed content
  • Free trial content