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Home / Journal of Nanoscience and Nanotechnology, Volume 21, Number 8

The Effects of the Rotational Speed of the Deposition Substrate on the Morphological and Current Injection Characteristics of LiF Thin Films

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In this study, we report the effects of the substrate rotational speed on the morphological characteristics of lithium fluoride (LiF) during thermal evaporation. LiF is used as a typical material in a vacuum-level shift-based electron injection layer and can improve both the charge injection and light emission properties when inserted into the electrode/organic material interface of organic light-emitting diodes (OLEDs). In general OLED research, rotary evaporation is widely used to ensure uniformity. However, there are few reports regarding the effects of this rotary evaporation method on the morphological characteristics of the thin films. Therefore, in this study, we analyzed the effects of rotary variations on the morphological and electron injection characteristics during deposition. The root mean square roughness of the LiF thin film deposited on Alq3 changed by up to 12.3%. Additionally, the driving voltage of the electron-only device showed a difference of 2.3 V at maximum and a change in the slope of the ohmic region was demonstrated. The morphological change in the LiF thin film based on the rotational speed of the substrate had a significant influence on the reaction at the electrode/organic material interface.

Keywords: Atomic Force Microscopy; Electron Injection Layer; Electron-Only Device; Lithium Fluoride; Morphology; Substrate Rotation

Document Type: Research Article

Affiliations: 1: Nano and Organic-Electronics Laboratory, Department of Display and Semiconductor Engineering, Sun Moon University, Asan, Chungcheongnam-do 31460, Republic of Korea 2: Center for Next Generation Semiconductor Technology, Department of Display and Semiconductor Engineering, Sun Moon University, Asan, Chungcheongnam-do 31460, Republic of Korea 3: Display and Nanosystem Laboratory, Department of Electrical Engineering, Korea University, 145, Anam-ro, Seoul 02841, Republic of Korea

Publication date: 01 August 2021

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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