Comparison of the Electrochemical Polishing of Copper and Aluminum in Acid and Acid-free Media

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© 2009 ECS - The Electrochemical Society
, , Citation Tarek M. Abdel-Fattah and Jon Derek Loftis 2009 ECS Trans. 25 327 DOI 10.1149/1.3203970

1938-5862/25/7/327

Abstract

Electrochemical polishing of aluminum and copper was conducted in 1 M phosphoric acid and in acid-free ionic liquid electrolyte prepared from quaternary ammonium salt as a green polishing solution. Voltammetry tests were used to determine the optimum condition for electrochemical polishing of aluminum and copper samples in both phosphoric acid and ionic liquid media. Atomic force microscopy (AFM), digital microscopy, and surface morphology comparisons summarized electrochemical polishing efficiency in term of surface roughness of acid and acid-free treatments for copper and aluminum. The eco-friendly ionic liquid produced polished surfaces superior to those surfaces produced with standard industrial acidic solution.

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