Preliminary Evaluation of Copolymers of Methyl Methacrylate and Acyloximino Methacrylate as Deep U.V. Resists

Copolymers of methyl methacrylate and acyloximino methacrylate esters have been evaluated as deep u.v. (200–250 nm) resists. Poly (methyl methacrylate‐co‐3‐methacryloyl‐oximino‐2‐butanone) has been found to be ∼5 times faster than PMMA at and capable of submicron resolution. It has been found that the acetyl group of the 3‐oximino‐2‐butanone substituent is more effective than the related species containing t‐butyl, phenyl, or benzoyl groups in promoting polymer degradation. The copolymers have also been exposed to 20 kV electron beam radiation and have been found to be about as sensitive as PMMA .