ABSTRACT
Directed Self-Assembly (DSA) is a very promising emerging lithography for 7nm and beyond, where a coarse guiding template produced by conventional optical lithography can "magically" generate fine-pitch vias/contacts through self-assembly process. A key challenge for DSA-friendly layout is the guiding template assignment to cover all vias under consideration. Meanwhile, redundant via insertion has been widely adopted to improve yield and reliability of the circuit. In this paper, we propose a comprehensive framework for concurrent DSA guiding template assignment and redundant via insertion with consideration of multiple patterning (MP) in guiding template generation. We first formulate the problem as an integer linear programming (ILP), and then propose a novel approximation algorithm to achieve good performance and runtime trade-off. The experimental results demonstrate the effectiveness of the proposed algorithms. To our best knowledge, this is the first work in concurrent guiding template assignment and redundant via insertion for DSA-MP hybrid lithography.
- Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hirokazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, and Takayuki Toshima. Contact hole shrink process using graphoepitaxial directed self-assembly lithography. JM3, 12(3), 2013.Google Scholar
- Seong-Jun Jeong, Ju Young Kim, Bong Hoon Kim, Hyoung-Seok Moon, and Sang Ouk Kim. Directed self-assembly of block copolymer for next generation nanolithography. Materials Today, 16(12):468--476, 2013.Google ScholarCross Ref
- David Z Pan, Bei Yu, and J-R Gao. Design for manufacturing with emerging nanolithography. IEEE TCAD, 32(10):1453--1472, 2013.Google ScholarDigital Library
- H.-S. Philip Wong, Chris Bencher, He Yi, Xin-Yu Bao, and Li-Wen Chang. Block copolymer directed self-assembly enables sublithographic patterning for device fabrication. In Proc. SPIE, volume 8323, 2012.Google Scholar
- Yuansheng Ma, Junjiang Lei, Juan Andres Torres, Le Hong, James Word, Germain Fenger, Alexander Tritchkov, George Lippincott, Rachit Gupta, Neal Lafferty, Yuan He, Joost Bekaert, and Geert Vanderberghe. Directed self-assembly (dsa) grapho-epitaxy template generation with immersion lithography. In Proc. SPIE, volume 9423, 2015.Google Scholar
- Azat Latypov, Tamer H. Coskun, Grant Garner, Moshe Preil, Gerard Schmid, Ji Xu, and Yi Zou. Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends. In Proc. SPIE, volume 9049, 2014.Google Scholar
- Sander Wuister, Tamara Druzhinina, Davide Ambesi, Bart Laenens, Linda He Yi, and Jo Finders. Influence of litho patterning on DSA placement errors. In Proc. SPIE, volume 9049, 2014.Google Scholar
- Yuansheng Ma, J. Andres Torres, Germain Fenger, Yuri Granik, Julien Ryckaert, Geert Vanderberghe, Joost Bekaert, and James Word. Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications. In Proc. SPIE, volume 9231, 2014.Google Scholar
- He Yi, Xin-Yu Bao, Jie Zhang, Richard Tiberio, James Conway, Li-Wen Chang, Subhasish Mitra, and H.-S. Philip Wong. Contact-hole patterning for random logic circuit using block copolymer directed self-assembly. In Proc. SPIE, volume 8323, 2012.Google ScholarCross Ref
- Yuelin Du, Zigang Xiao, Martin D.F. Wong, He Yi, and H.-S. Philip Wong. DSA-aware detailed routing for via layer optimization. In Proc. SPIE, volume 9049, 2014.Google Scholar
- Zigang Xiao, Yuelin Du, Haitong Tian, Martin D. F. Wong, He Yi, H-S Philip Wong, and Hongbo Zhang. Directed self-assembly (DSA) template pattern verification. In Proc. DAC, pages 55:1--55:6, 2014.Google Scholar
- Yuelin Du, Daifeng Guo, Martin D. F. Wong, He Yi, H.-S. Philip Wong, Hongbo Zhang, and Qiang Ma. Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library. In Proc. ICCAD, pages 186--193, 2013.Google ScholarCross Ref
- Zigang Xiao, Yuelin Du, Martin D.F. Wong, and Hongbo Zhang. DSA template mask determination and cut redistribution for advanced 1D gridded design. In Proc. SPIE, volume 8880, 2013.Google ScholarCross Ref
- Jiaojiao Ou, Bei Yu, Jhih-Rong Gao, and David Z. Pan. Directed self-assembly cut mask assignment for unidirectional design. JM3, 14(3), 2015.Google Scholar
- Yasmine Badr, Andres Torres, and Puneet Gupta. Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias. In Proc. DAC, pages 70:1--70:6, 2015.Google ScholarDigital Library
- Yasmine Badr, Juan Andres Torres, Yuansheng Ma, Joydeep Mitra, and Puneet Gupta. Incorporating DSA in multipatterning semiconductor manufacturing technologies. In Proc. SPIE, volume 9427, 2015.Google Scholar
- Kuang-Yao Lee and Ting-Chi Wang. Post-routing redundant via insertion for yield/reliability improvement. In Proc. ASPDAC, pages 303--308, 2006.Google ScholarDigital Library
- Kuang-Yao Lee, Cheng-Kok Koh, Ting-Chi Wang, and Kai-Yuan Chao. Fast and optimal redundant via insertion. IEEE TCAD, 27(12):2197--2208, 2008.Google Scholar
- Gang Xu, Li-Da Huang, David Z Pan, and Martin DF Wong. Redundant-via enhanced maze routing for yield improvement. In Proc. ASPDAC, pages 1148--1151, 2005.Google ScholarDigital Library
- Huang-Yu Chen, Mei-Fang Chiang, Yao-Wen Chang, Lumdo Chen, and Brian Han. Full-chip routing considering double-via insertion. IEEE TCAD, 27(5):844--857, 2008.Google ScholarDigital Library
- Kuang-Yao Lee, Cheng-Kok Koh, Ting-Chi Wang, and Kai-Yuan Chao. Optimal post-routing redundant via= insertion. In Proc. ISPD, pages 111{117, 2008.Google ScholarDigital Library
- Jiwoo Pak, Bei Yu, and David Z. Pan. Electromigration-aware redundant via insertion. In Proc. ASPDAC, pages 544{549, 2015.Google ScholarCross Ref
- Monaldo Mastrolili and Georgios Stamoulis. Constrained= matching problems in bipartite graphs. In Proc. ISCO, pages 344{355, 2014.Google Scholar
- Jan Plesnik. Constrained weighted matchings and edge coverings in graphs. Discrete Applied Mathematics, 92(2--3):229{241, Jun. 1999.Google Scholar
- CBC. http://www.coin-or.org/projects/Cbc.xml.Google Scholar
- OpenSPARC T1. http://www.oracle.com/technetwork/ systems/opensparc/index.html.Google Scholar
- Synopsys Design Compiler. http://www.synopsys.com.Google Scholar
- NanGate FreePDK45 Generic Open Cell Library. http://www.si2.org/openeda.si2.org/projects/nangatelib, 2008.Google Scholar
- Cadence SOC Encounter. http://www.cadence.com.Google Scholar
Index Terms
- Concurrent Guiding Template Assignment and Redundant via Insertion for DSA-MP Hybrid Lithography
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