Optical Improvement of ZnO-Coated Glass with New Refractive-Index Matching Layer Inserted at Glass/ZnO Interface

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Published 22 October 2012 • Copyright (c) 2012 The Japan Society of Applied Physics
, , Citation Bancha Janthong et al 2012 Jpn. J. Appl. Phys. 51 10NB14 DOI 10.1143/JJAP.51.10NB14

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Author affiliations

1 Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan

2 The Pennsylvania State University, University Park, PA 16801, U.S.A.

3 Photovoltaics Research Center (PVREC), Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan

Dates

  1. Received 10 December 2011
  2. Accepted 21 February 2012
  3. Published

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Abstract

We prepared and applied a-SiOx thin films to hydrogenated microcrystalline silicon solar cells (µc-Si:H) as a front antireflection layer (FAL) in order to reduce optical reflection loss. By inserting the optimized SiOx FAL with a refractive index of ∼1.75 into the glass/ZnO interface a relative increase in short-circuit current density (Jsc) by 5% could be obtained which corresponded to an improved spectral response in the 550–950 nm wavelength regions. In addition, this optimized FAL did not deteriorate the properties of the ZnO layer because no significant changes in open-circuit voltage (Voc) and fill factor (FF) were observed. As a result, the cell with an efficiency of as high as 8.28% (Voc=0.495 V, Jsc=25.09 mA/cm2, FF=0.667) could be obtained.

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10.1143/JJAP.51.10NB14