Photoluminescence from Localized Excitons in Si/Ge Superlattices

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Copyright (c) 1994 The Japan Society of Applied Physics
, , Citation Joachim Hartung Joachim Hartung et al 1994 Jpn. J. Appl. Phys. 33 2340 DOI 10.1143/JJAP.33.2340

1347-4065/33/4S/2340

Abstract

Short period strained-layer Si/Ge superlattices grown by molecular beam epitaxy have been investigated by photoluminescence spectroscopy. In 16×4, 15×4 and 12×4 superlattices with 80 or 120 periods two new luminescence peaks appear. From their separation in photon energy, the two peaks are assigned to a no-phonon transition and its silicon transverse optical phonon replica. Detailed photoluminescence investigations have confirmed that the new peaks which appear at energies between 0.85 and 1.05 eV give evidence for radiative recombination in the superlattices. From their luminescence intensity as well as lineshape dependence on the excitation power we attribute the new peaks to localized excitons.

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10.1143/JJAP.33.2340