Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on Si

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Copyright (c) 2001 The Japan Society of Applied Physics
, , Citation Hideki Masuda et al 2001 Jpn. J. Appl. Phys. 40 L1267 DOI 10.1143/JJAP.40.L1267

1347-4065/40/11B/L1267

Abstract

Application of imprinting of vacuum-evaporated Al on a Si substrate using an SiC mold with an ordered array of hexagonally arranged convexes and subsequent anodization yielded an ideally ordered porous alumina mask on the substrate. The obtained alumina mask has sufficient adhesion to a Si substrate, and was used as a mask for vacuum evaporation of metal and ion milling of the Si substrate.

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10.1143/JJAP.40.L1267