Abstract
The physicochemical properties of amorphous silica prepared by the fluoride technology are studied; the surface of silica is modified by direct fluorination with F2-gas or c-C4F8 radio-frequency plasma. The modification of the surface physical chemical properties after fluorination are compared with the initial silica and analyzed by X-ray photoelectron spectroscopy, IR spectroscopy, and transmission electron microscopy.
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Original Russian Text © L.P. Demyanova, A. Tressaud, 2012, published in Fizikokhimiya Poverkhnosti i Zashchita Materialov, 2012, Vol. 48, No. 2, pp. 191–196.
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Demyanova, L.P., Tressaud, A. Modification of the surface of nanodisperse amorphous silica prepared by fluoride technology. Prot Met Phys Chem Surf 48, 211–216 (2012). https://doi.org/10.1134/S2070205112020062
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DOI: https://doi.org/10.1134/S2070205112020062