Abstract
Cerium oxide thin films are deposited on quartz substrate using pulsed laser deposition technique at a substrate temperature 973 K with an oxygen partial pressure of 0.2 Pa. The properties of the grown films mainly depend on the quality of the deposition. In the present investigation the deposition is carried out using excimer laser (KrF). To improve the microstructure and crystallite properties the deposited thin films are annealed at 1073 K for 2 h. The prepared and annealed thin films characterized by X-ray diffraction, atomic force microscope (AFM) and UV-visible spectroscopy: X-ray diffraction analysis confirmed the polycrystalline nature of the thin films. Crystallite size, lattice constant and texture coefficient are calculated. The film thickness is measured using XP-1 stylus profiler, optical band gap has been carried out and surface roughness has been estimated from AFM.
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Nagaraju, P., Vijayakumar, Y. & Ramana Reddy, M.V. Optical and microstructural studies on laser ablated nanocrystalline CeO2 thin films. Glass Phys Chem 41, 484–488 (2015). https://doi.org/10.1134/S1087659615050107
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DOI: https://doi.org/10.1134/S1087659615050107