Abstract
The possibility of plasma chemical conversion of hydrogen chloride was explored. It was shown that, for the typical conditions of atmospheric pressure discharges, the use of pure HCl as the plasma-forming gas does not provide the conversion degrees higher than 4%. It was found that high (>95%) HCl conversion degrees, as well as maximum yields of Cl2 may be obtained in HCl-O2 mixtures due to the plasma-assisted oxidative decomposition of the reactant. The optimal process conditions in terms of the electron density and feed gas composition were determined.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Ekologiya (Ecology), Tsvetkova, L.I., Ed., Moscow: ASV; St. Petersburg: Khimizdat, 1999.
Lebedev, N.N., Khimiya i tekhnologiya osnovnogo organicheskogo i neftekhimicheskogo sinteza (Chemistry and Technology of Basic Organic and Petrochemical Synthesis), Moscow: Khimiya, 1981, 3rd ed.
Promyshlennye khlororganicheskie produkty (Industrial Organochlorine Products), Oshin L.A., Ed., Moscow: Khimiya, 1978.
Levinskii, M.I., Mazanko, A.F., and Novikov, I.N., Khloristyi vodorod i solyanaya kislota (Hydrogen Chloride and Hydrochloric Acid), Moscow: Khimiya, 1985.
Obzor rynka khlora v SNG i prognoz ego razvitiya v usloviyakh finansovogo krizisa (Chlorine Market Review for CIS and Forecast of Its Development under Financial Crisis Conditions), INFOMINE, 2009.
Yakimenko, L.M., Elektrokhimicheskie protsessy v khimicheskoi promyshlennosti: Proizvodstvo vodoroda, kisloroda, khlora i shchelochei (Electrochemical Processes in the Chemical Industry: Production of Hydrogen, Oxygen, Chlorine, and Alkalis), Moscow: Khimiya, 1981.
Nizkotemperaturnaya plazma (Low-Temperature Plasma), vol. 4: Plazmokhimicheskie tekhnologii (Plasma Chemical Technologies), Novosibirsk: Nauka, Sib. Otd., 1991.
Bugaenko, L.T., Kuz’min, M.G., and Polak, L.S., Khimiya vysokikh energii (High-Energy Chemistry), Moscow: Khimiya, 1988.
Suris, A.L., Plazmokhimicheskie protsessy i apparaty (Plasma Chemical Processes and Devices), Moscow: Khimiya, 1989.
Lieberman, M.A. and Lichtenberg, A.J., Principles of Plasma Discharges and Materials Processing, New York: Wiley, 1994.
Conrads, H. and Schmidt, M., Plasma Sources Sci. Technol., 2000, vol. 9, pp. 441–454.
Morgan, W.L., Plasma Chem. Plasma Process, 1992, vol. 12, p. 449.
Efremov, A.M., Svetsov, V.I., and Balashov, D.I., Contrib. Plasma Phys., 1999, vol. 39, pp. 247–250.
Kondrat’ev, V.N., Konstanty skorostei gazofaznykh reaktsii: Spravochnik (Rate Constants of Gas-Phase Reactions: Reference Book), Moscow: Nauka, 1971.
NIST Chemical Kinetics Database, http://kinetics.nist.gov/kinetics/index.jsp.
Kota, G.P., Coburn, J.W., and Graves, D.B., J. Vac. Sci. Technol. A, 1998, vol. 16, p. 270.
Wood, B.J. and Wise, H., J. Phys. Chem., 1961, vol. 65, p. 110.
Lopaev, D.V., Malykhin, E.M., and Zyryanov, S.M., J. Phys. D. Appl. Phys., 2011, vol. 44, p. 1.
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.M. Efremov, E.S. Titova, 2014, published in Rossiiskii Khimicheskii Zhurnal, 2014, Vol. 58, No. 2, pp. 68–73.
Rights and permissions
About this article
Cite this article
Efremov, A.M., Titova, E.S. On the possibility of plasma chemical conversion of hydrogen chloride. Russ J Gen Chem 86, 478–483 (2016). https://doi.org/10.1134/S1070363216020481
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1070363216020481