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Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate

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Abstract

The surface of AISI 316L stainless steel has been modified by depositing an a-C:H:SiOx film using plasma-assisted chemical vapor-phase deposition with the application of a pulsed bipolar bias voltage of the substrate. The mechanical properties of the film and the AISI 316L steel surface have been investigated using the nanoindentation method; tribological tests have been performed using a ball-on-disk tribometer. The optimal amplitude of the negative bipolar bias voltage pulse has been determined, for which the a-C:H:SiOx film exhibits a high hardness (19 ± 2 GPa) that is 3.5 times higher than the hardness of the AISI 316L steel surface (5.5 ± 0.1 GPa). The film has a low friction coefficient (0.08), which is nine times smaller than that for the steel (0.72), while the wear rates are 8.5 × 10–7 and 3.7 × 10–5 mm3 N–1 m–1, respectively. The structure and the composition of the resulting films have been analyzed using Raman spectroscopy and scanning electron microscopy.

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ACKNOWLEDGMENTS

The authors are grateful to the Tomsk Research Center, Siberian Branch, Russian Academy of Sciences, for the providing the NanoTest 600 nanoindenter. Thanks are due to A.V. Shipilova, a researcher at the Institute of High-Current Electronics, who obtained photographs of the scanning electron microscope images.

Funding

This study was supported under state order no. FWRM-2021-0006 by a grant from the President of the Russian Federation, project no. MK-1234.2020.8.

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Authors and Affiliations

  1. Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, 634055, Tomsk, Russia

    A. S. Grenadyorov, A. A. Solovyev, K. V. Oskomov & M. O. Zhulkov

  2. National Medical Research Center Named after Academician Meshalkin, 630055, Novosibirsk, Russia

    M. O. Zhulkov

Authors
  1. A. S. Grenadyorov
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  2. A. A. Solovyev
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  3. K. V. Oskomov
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  4. M. O. Zhulkov
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Correspondence to A. S. Grenadyorov.

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Translated by N. Wadhwa

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Grenadyorov, A.S., Solovyev, A.A., Oskomov, K.V. et al. Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate. Tech. Phys. 66, 1111–1117 (2021). https://doi.org/10.1134/S1063784221080089

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  • DOI: https://doi.org/10.1134/S1063784221080089

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