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Effect of high-temperature annealing on solid-state reactions in hydroxyapatite/TiO2 films on titanium substrates

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Abstract

Hydroxyapatite (HA) films 0.5 and 1 μm thick with a 0.2-μm TiO2 underlayer have been grown on titanium by rf magnetron sputtering. After annealing in an argon atmosphere at 900, 950, and 1000°C for 30 and 60 min, the phase composition, elemental composition, and surface morphology of the films have been determined by scanning electron microscopy, X-ray microanalysis, and X-ray diffraction. The surface microstructure of the films is shown to depend on annealing temperature. X-ray microanalysis results indicate that, at HA layer thicknesses of both 1 and 0.5 μm, the Ca/P ratio increases with annealing temperature. In addition, the Ca/P ratio in the films produced under identical conditions depends on the film thickness. X-ray diffraction data indicate the presence of reaction intermediates. A TiO2 interlayer in the HA/Ti system inhibits titanium oxidation, and the reaction intermediates forming during heat treatment improve the adhesion between the titanium and HA.

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Authors and Affiliations

  1. Voronezh State University, Universitetskaya pl. 1, Voronezh, 394006, Russia

    A. Yu. Berezhnaya, E. V. Kukueva & I. Ya. Mittova

  2. Burdenko State Medical Academy, Studencheskaya ul. 10, Voronezh, 394036, Russia

    V. O. Mittova

Authors
  1. A. Yu. Berezhnaya
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  2. V. O. Mittova
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  3. E. V. Kukueva
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  4. I. Ya. Mittova
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Correspondence to A. Yu. Berezhnaya.

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Original Russian Text © A.Yu. Berezhnaya, V.O. Mittova, E.V. Kukueva, I.Ya. Mittova, 2010, published in Neorganicheskie Materialy, 2010, Vol. 46, No. 9, pp. 1083–1089.

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Berezhnaya, A.Y., Mittova, V.O., Kukueva, E.V. et al. Effect of high-temperature annealing on solid-state reactions in hydroxyapatite/TiO2 films on titanium substrates. Inorg Mater 46, 971–977 (2010). https://doi.org/10.1134/S0020168510090098

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  • DOI: https://doi.org/10.1134/S0020168510090098

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