Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture

Martin Foldyna; Thomas A. Germer; Brent C. Bergner

doi:10.1117/12.879518

20 April 2011 Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture

Martin Foldyna, Thomas A. Germer, Brent C. Bergner

Author Affiliations +

Proceedings Volume 7971, Metrology, Inspection, and Process Control for Microlithography XXV; 79710N (2011) https://doi.org/10.1117/12.879518
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multiple azimuthal configurations using a generalized ellipsometer, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture, introducing significant depolarization effects, and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the artificially perturbed grating were then fit using the same model, and the resulting root-mean-square error (RMSE) values for both targets were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.

Citation Download Citation

Martin Foldyna, Thomas A. Germer, and Brent C. Bergner "Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture", Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79710N (20 April 2011); https://doi.org/10.1117/12.879518

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