Presculpting of photoresists using additive lithography

Mahesh Pitchumani; Waleed S. Mohammed; Heidi Hockel; Eric G. Johnson

doi:10.1117/12.538385

29 December 2003 Presculpting of photoresists using additive lithography

Mahesh Pitchumani, Waleed S. Mohammed, Heidi Hockel, Eric G. Johnson

Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.538385
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this paper we present the fabrication of refractive micro optical elements by additive sculpting of the photoresist using binary amplitude masking techniques. We also present the fabrication of micro optical elements by pre sculpting the photoresist before reflow. This enables the use of fewer masking patterns while allowing us to obtain smooth profiles on the resist. The resist can be pre sculpted into any shape by using a set of binary patterns thus allowing us to fabricate refractive beam shaping elements.

Citation Download Citation

Mahesh Pitchumani, Waleed S. Mohammed, Heidi Hockel, and Eric G. Johnson "Presculpting of photoresists using additive lithography", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.538385

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