Metal-oxide lift-off for optimized heterointegration of photonic circuits

Tomoyuki Izuhara; Ryan Roth; Djordje Djukic; Antonije M. Radojevic; Richard M. Osgood Jr.; Sasha Bakhru; Hassaram Bakhru

doi:10.1117/12.537850

14 June 2004 Metal-oxide lift-off for optimized heterointegration of photonic circuits

Tomoyuki Izuhara, Ryan Roth, Djordje Djukic, Antonije M. Radojevic, Richard M. Osgood Jr., Sasha Bakhru, Hassaram Bakhru

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Proceedings Volume 5356, Optoelectronic Integrated Circuits VI; (2004) https://doi.org/10.1117/12.537850
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

Crystal ion slicing can fabricate microns-thin-films from bulk, single-crystal metal oxides, which are important materials in optical, microwave, and electrical applications. These thin-films maintain single-crystal properties, which are very difficult to achieve in other thin-film technologies such as epitaxial growth. In this paper, ion-slicing technique is reviewed briefly from a process, material, and device perspective. The demonstrated applications in integrated optics are listed, along with a complete reference to ion-slicing related publications.

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Tomoyuki Izuhara, Ryan Roth, Djordje Djukic, Antonije M. Radojevic, Richard M. Osgood Jr., Sasha Bakhru, and Hassaram Bakhru "Metal-oxide lift-off for optimized heterointegration of photonic circuits", Proc. SPIE 5356, Optoelectronic Integrated Circuits VI, (14 June 2004); https://doi.org/10.1117/12.537850

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