Paper
1 July 2003 MOCVD-grown InAs/GaAs quantum dots
Diana L. Huffaker, S. Birudavolu
Author Affiliations +
Abstract
We discuss a growth technique for producing a high quality quantum dot (QD) ensemble that has both high QD density and low defect density. The growth conditions under which the QDs nucleate, are optimized to form high density QDs with few defects, however, it is very difficult to prevent coalescence completely. Pausing the AsH3 flow for a few seconds after nucleation allows surface adatoms to migrate from poly-crystalline defect sites where the bond strengths are weak to crystalline QD sites. We will discuss statistical analysis based on atomic force microscope (AFM) images, high-resolution transmission electron microscopy (HRTEM), and electroluminescence (EL) to characterize the effects of AsH3 pauses on the QD density and crystallographic shape. Ground state PL from capped QDs is measured at 1.38 μm with a 40 meV linewidth. We demonstrate lasing from the first excited state under room-temperature pulsed characteristics.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diana L. Huffaker and S. Birudavolu "MOCVD-grown InAs/GaAs quantum dots", Proc. SPIE 4999, Quantum Sensing: Evolution and Revolution from Past to Future, (1 July 2003); https://doi.org/10.1117/12.488041
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Crystals

Indium arsenide

Electroluminescence

Gallium arsenide

Atomic force microscopy

Gallium

Metalorganic chemical vapor deposition

Back to Top