Paper
10 September 1998 Novel monolithic and multilevel integration of high-precision 3-D microfluidic components
Jun-Bo Yoon, Chul-Hi Han, Euisik Yoon, Choong-Ki Kim
Author Affiliations +
Proceedings Volume 3515, Microfluidic Devices and Systems; (1998) https://doi.org/10.1117/12.322085
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
A novel fabrication process has been devised for monolithic integration of multilevel passive microfluidic components, which are channel, reservoir and orifices, as a single body. These components are precisely defined by single-step 3D photolithography followed by single-step electroplating. This single-step fabrication of the components is possible by forming the 3D photoresist mold, which has channel and reservoir parts in the lower layer and an orifice part in the upper layer. We obtain this multilevel photoresist mold using multiple exposures with varying exposure depths, followed by a single development step, which realizes the 3D latent image of the unexposed volume in the photoresist. By merely repeating these processes, we have easily fabricated single-body two-level microfluidic components. The microfluidic channels can cross each other on a different level and microfluid in different levels can join through the first-level orifices (microfluidic via). Two outmost orifices can be used as both inlet and outlet. These multilevel structures are similar to multilevel interconnection in VLSI. This process is easy, simple, and compatible to integrated circuit process owing to low process temperature (< 120 degree(s)C) and the monolithic feature. Additionally, this single-body fabrication improves a process yield and reliability of the components very much.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun-Bo Yoon, Chul-Hi Han, Euisik Yoon, and Choong-Ki Kim "Novel monolithic and multilevel integration of high-precision 3-D microfluidic components", Proc. SPIE 3515, Microfluidic Devices and Systems, (10 September 1998); https://doi.org/10.1117/12.322085
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CITATIONS
Cited by 5 scholarly publications and 1 patent.
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KEYWORDS
Microfluidics

Photoresist materials

Metals

Electroplating

Photoresist developing

Optical lithography

3D image processing

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