Influence of Al ion implantation on electrical and optical properties in nitride TJ VCSEL

P. Śpiewak; M. Wasiak; R. P. Sarzała

doi:10.1117/12.2511134

1 March 2019 Influence of Al ion implantation on electrical and optical properties in nitride TJ VCSEL

P. Śpiewak, M. Wasiak, R. P. Sarzała

Proceedings Volume 10918, Gallium Nitride Materials and Devices XIV; 109181L (2019) https://doi.org/10.1117/12.2511134
Event: SPIE OPTO, 2019, San Francisco, California, United States

Abstract

In this paper, we present numerical simulations of nitride tunnel junction VCSELs (Vertical-Cavity Surface-Emitting Laser). This analysis concerned lasers emitting 405 nm wavelength. The simulated VCSEL is similar to the structure fabricated at University of California, Santa Barbara (UCSB). This structure has an Al-ion implantation applied for outer regions of the cavity. The results show how threshold parameters (threshold temperature and threshold current) and emitted power depend on the contrast of the refractive index in this implantation. We also analyze the influence of the implantation thickness and dimensions of the electrical aperture of the laser on capacitance phenomena occurring in the laser.

Citation Download Citation

P. Śpiewak, M. Wasiak, and R. P. Sarzała "Influence of Al ion implantation on electrical and optical properties in nitride TJ VCSEL ", Proc. SPIE 10918, Gallium Nitride Materials and Devices XIV, 109181L (1 March 2019); https://doi.org/10.1117/12.2511134

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