Sub-quarter-micrometer contact hole fabrication using annular illumination

Miklos Erdelyi; Zsolt Bor; Gabor Szabo; Joseph R. Cavallaro; Michael C. Smayling; Frank K. Tittel; William L. Wilson Jr.

doi:10.1117/12.240953

7 June 1996 Sub-quarter-micrometer contact hole fabrication using annular illumination

Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Joseph R. Cavallaro, Michael C. Smayling, Frank K. Tittel, William L. Wilson Jr.

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Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240953
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Details of an experimental demonstration of a contact hole imaging system are reported in which the depth of focus is increased by a factor of about 3.5 using annular illumination. Due to spatial filtering and nonlinearity of the photoresist, the resolving power was enhanced by 52 percent and it was possible to pattern a 0.28 micrometers contact hole in photoresist deposited on a silica substrate. This technique is capable of fabrication sub-quarter micron holes using excimer laser radiation at 193 nm.

Citation Download Citation

Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Joseph R. Cavallaro, Michael C. Smayling, Frank K. Tittel, and William L. Wilson Jr. "Sub-quarter-micrometer contact hole fabrication using annular illumination", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240953

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