Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Makoto Muramatsu; Mitsuaki Iwashita; Takahiro Kitano; Takayuki Toshima; Mark H. Somervell; Yuriko Seino; Daisuke Kawamura; Masahiro Kanno; Katsutoshi Kobayashi; Tsukasa Azuma

doi:10.1117/1.JMM.11.3.031305

9 July 2012 Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark H. Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3, 031305 (July 2012). https://doi.org/10.1117/1.JMM.11.3.031305

Abstract

A method for using wet development in a directed self-assembly lithography (DSAL) application is reported. For the typical diblock copolymer poly(styrene-block-methyl methacrylate) (PS-b-PMMA), the PMMA area is removed by an oxygen plasma. However, the oxygen plasma has poor selectivity for the PS portion of the block polymer and etches it simultaneously. As a result, the thickness of the residual PS pattern is thinner than desired and creates a challenge for subsequent pattern transfer. A wet development technique is discussed which offers higher selectivity between the PMMA and PS blocks in the assembled pattern. Specifically, a method using a low pressure mercury lamp and conventional tetramethylammonium hydroxide (TMAH, 2.38%) developer is proposed. Using this method, DSA pattern formation is completed in a single track having coating, baking, exposure, and development modules.

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Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark H. Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, and Tsukasa Azuma "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031305 (9 July 2012). https://doi.org/10.1117/1.JMM.11.3.031305

Published: 9 July 2012

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