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Characterization of 1- and 2μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light

R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W. Ubachs, R. Hoekstra, and O. O. Versolato
Phys. Rev. Research 3, 013294 – Published 31 March 2021

Abstract

Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet (EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin microdroplets by 5-ns-pulsed, 2μm-wavelength laser light. Emission spectra are compared to those obtained from plasma driven by 1μm-wavelength laser light over a range of laser intensities spanning approximately (0.35)×1011W/cm2, under otherwise identical conditions. Over this range of drive laser intensities, we find that similar spectra and underlying plasma charge state distributions are obtained when keeping the ratio of 1- to 2μm laser intensities fixed at a value of 2.1(6), which is in good agreement with ralef-2d radiation-hydrodynamic simulations. Our experimental findings, supported by the simulations, indicate an approximately inversely proportional scaling λ1 of the relevant plasma electron density, and of the aforementioned required drive laser intensities, with drive laser wavelength λ. This scaling also extends to the optical depth that is captured in the observed changes in spectra over a range of droplet diameters spanning 16–51 μm at a constant laser intensity that maximizes the emission in a 2% bandwidth around 13.5nm relative to the total spectral energy, the bandwidth relevant for EUV lithography. The significant improvement of the spectral performance of the 2μm- versus 1μm driven plasma provides strong motivation for the development of high-power, high-energy near-infrared lasers to enable the development of more efficient and powerful sources of EUV light.

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  • Received 23 July 2020
  • Accepted 26 February 2021

DOI:https://doi.org/10.1103/PhysRevResearch.3.013294

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Plasma Physics

Authors & Affiliations

R. Schupp1, L. Behnke1,3, J. Sheil1, Z. Bouza1,3, M. Bayraktar2, W. Ubachs1,3, R. Hoekstra1,4, and O. O. Versolato1,3,*

  • 1Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, the Netherlands
  • 2Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, the Netherlands
  • 3Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1081, 1081 HV Amsterdam, the Netherlands
  • 4Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, the Netherlands

  • *o.versolato@arcnl.nl

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Vol. 3, Iss. 1 — March - May 2021

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