Thermal stability of interstitial and substitutional Mn in ferromagnetic (Ga,Mn)As

T. A. L. Lima, U. Wahl, A. Costa, V. Augustyns, K. W. Edmonds, B. L. Gallagher, R. P. Campion, J. P. Araújo, J. G. Correia, M. R. da Silva, K. Temst, A. Vantomme, and L. M. C. Pereira
Phys. Rev. B 100, 144409 – Published 7 October 2019

Abstract

In (Ga,Mn)As, a model dilute magnetic semiconductor, the electric and magnetic properties are strongly influenced by the lattice sites occupied by the Mn atoms. In particular, the highest Curie temperatures are achieved upon thermal annealing in a narrow temperature window around 200C, by promoting the diffusion of interstitial Mn towards the surface. In this work, we determined the thermal stability of both interstitial and substitutional Mn in ferromagnetic (Ga,Mn)As thin films, using the emission channeling technique. At a higher Mn concentration, the temperatures at which substitutional and interstitial Mn become mobile not only decrease, but also become closer to each other. These findings advance our understanding of self-compensation in (Ga,Mn)As by showing that the strong dependence of the Curie temperature on annealing temperature around 200C is a consequence of balance between diffusion of interstitial Mn and segregation of substitutional Mn.

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  • Received 8 July 2019
  • Revised 4 September 2019

DOI:https://doi.org/10.1103/PhysRevB.100.144409

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

T. A. L. Lima1, U. Wahl1,2, A. Costa2, V. Augustyns1, K. W. Edmonds3, B. L. Gallagher3, R. P. Campion3, J. P. Araújo4, J. G. Correia2, M. R. da Silva2, K. Temst1, A. Vantomme1, and L. M. C. Pereira1,*

  • 1KU Leuven, Instituut voor Kern- en Stralingsfysica, 3001 Leuven, Belgium
  • 2Centro de Ciências e Tecnologias Nucleares, Instituto Superior Técnico, Universidade de Lisboa, 2686-953 Sacavém, Portugal
  • 3School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom
  • 4IFIMUP and IN-Institute of Nanoscience and Nanotechnology, Universidade do Porto, 4169-007 Porto, Portugal

  • *lino.pereira@kuleuven.be

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Issue

Vol. 100, Iss. 14 — 1 October 2019

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