Abstract
The metal-insulator transition of is thought to be important for the functioning of recent niobium oxide-based memristor devices, and is often described as a Mott transition in these contexts. However, the actual transition mechanism remains unclear, as current devices actually employ electroformed that may be inherently different to crystalline . We report on our synchrotron x-ray spectroscopy and density-functional-theory study of crystalline, epitaxial thin films grown by pulsed laser deposition and molecular beam epitaxy across the metal-insulator transition at . The observed spectral changes reveal a second-order Peierls transition driven by a weakening of Nb dimerization without significant electron correlations, further supported by our density-functional-theory modeling. Our findings indicate that employing crystalline as an active layer in memristor devices may facilitate analog control of the resistivity, whereby Joule-heating can modulate Nb-Nb dimer distance and consequently control the opening of a pseudogap.
- Received 28 January 2019
- Revised 17 May 2019
DOI:https://doi.org/10.1103/PhysRevMaterials.3.074602
©2019 American Physical Society