Evidence of a second-order Peierls-driven metal-insulator transition in crystalline NbO2

Matthew J. Wahila, Galo Paez, Christopher N. Singh, Anna Regoutz, Shawn Sallis, Mateusz J. Zuba, Jatinkumar Rana, M. Brooks Tellekamp, Jos E. Boschker, Toni Markurt, Jack E. N. Swallow, Leanne A. H. Jones, Tim D. Veal, Wanli Yang, Tien-Lin Lee, Fanny Rodolakis, Jerzy T. Sadowski, David Prendergast, Wei-Cheng Lee, W. Alan Doolittle, and Louis F. J. Piper
Phys. Rev. Materials 3, 074602 – Published 16 July 2019
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Abstract

The metal-insulator transition of NbO2 is thought to be important for the functioning of recent niobium oxide-based memristor devices, and is often described as a Mott transition in these contexts. However, the actual transition mechanism remains unclear, as current devices actually employ electroformed NbOx that may be inherently different to crystalline NbO2. We report on our synchrotron x-ray spectroscopy and density-functional-theory study of crystalline, epitaxial NbO2 thin films grown by pulsed laser deposition and molecular beam epitaxy across the metal-insulator transition at 810C. The observed spectral changes reveal a second-order Peierls transition driven by a weakening of Nb dimerization without significant electron correlations, further supported by our density-functional-theory modeling. Our findings indicate that employing crystalline NbO2 as an active layer in memristor devices may facilitate analog control of the resistivity, whereby Joule-heating can modulate Nb-Nb dimer distance and consequently control the opening of a pseudogap.

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  • Received 28 January 2019
  • Revised 17 May 2019

DOI:https://doi.org/10.1103/PhysRevMaterials.3.074602

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Matthew J. Wahila1, Galo Paez1, Christopher N. Singh1, Anna Regoutz2, Shawn Sallis3, Mateusz J. Zuba3, Jatinkumar Rana1, M. Brooks Tellekamp4, Jos E. Boschker5, Toni Markurt5, Jack E. N. Swallow6, Leanne A. H. Jones6, Tim D. Veal6, Wanli Yang7, Tien-Lin Lee8, Fanny Rodolakis9, Jerzy T. Sadowski10, David Prendergast11, Wei-Cheng Lee1, W. Alan Doolittle4, and Louis F. J. Piper1,3,*

  • 1Department of Physics, Binghamton University, State University of New York, Binghamton, New York 13850, USA
  • 2Department of Materials, Imperial College London, London SW7 2AZ, United Kingdom
  • 3Materials Science and Engineering, Binghamton University, State University of New York, Binghamton, New York 13850, USA
  • 4School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA
  • 5Leibniz-Institut für Kristallzüchtung, Max-Born Straße 2, 12489 Berlin, Germany
  • 6Stephenson Institute for Renewable Energy and Department of Physics, University of Liverpool, Liverpool L69 7ZF, United Kingdom
  • 7Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 8Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot OX11 0DE, United Kingdom
  • 9Argonne National Laboratory, 9700 South Cass Avenue, Argonne, Illinois 60439, USA
  • 10Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
  • 11The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA

  • *lpiper@binghamton.edu

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Issue

Vol. 3, Iss. 7 — July 2019

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