Proton Magnetic Resonance Spectra of Plasma-Deposited Amorphous Si: H Films

J. A. Reimer, R. W. Vaughan, and J. C. Knights
Phys. Rev. Lett. 44, 193 – Published 21 January 1980
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Abstract

Proton magnetic resonance data are presented for a series of plasma-deposited a-Si: H films with hydrogen contents ranging from 32 to 8 at.%. Line-shape and line-width analysis leads to the conclusion that the spatial distribution of hydrogen is inhomogeneous in all samples.

  • Received 2 October 1979

DOI:https://doi.org/10.1103/PhysRevLett.44.193

©1980 American Physical Society

Authors & Affiliations

J. A. Reimer and R. W. Vaughan*

  • Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California 91125

J. C. Knights

  • Xerox Palo Alto Research Center, Palo Alto, California 94304

  • *Deceased.

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Vol. 44, Iss. 3 — 21 January 1980

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