Abstract
The metal-to-insulator transition in is investigated using electrostatic doping, which avoids effects from disorder and strain that would accompany chemical doping. heterostructures are doped with a constant sheet carrier density of that is introduced via the polar interface. Below a critical thickness, the structures exhibit metallic behavior with high carrier mobilities at low temperatures, similar to interfaces. Above this thickness, data indicate that the layer becomes ferroelectric. The lattice parameters increase to a value consistent with a strained, tetragonal unit cell, the structures are insulating below , and the mobility drops by more than an order of magnitude, indicating self-trapping of carriers. The results shed light on the interplay between charge carriers and ferroelectricity.
- Received 3 March 2016
DOI:https://doi.org/10.1103/PhysRevLett.117.037602
© 2016 American Physical Society