Acceptor Levels in p-Type Cu2O: Rationalizing Theory and Experiment

David O. Scanlon, Benjamin J. Morgan, Graeme W. Watson, and Aron Walsh
Phys. Rev. Lett. 103, 096405 – Published 28 August 2009

Abstract

Understanding conduction in Cu2O is vital to the optimization of Cu-based p-type transparent conducting oxides. Using a screened hybrid–density-functional approach we have investigated the formation of p-type defects in Cu2O giving rise to single-particle levels that are deep in the band gap, consistent with experimentally observed activated, polaronic conduction. Our calculated transition levels for simple and split copper vacancies explain the source of the two distinct hole states seen in DLTS experiments. The necessity of techniques that go beyond the present generalized-gradient- and local-density-approximation techniques for accurately describing p-type defects in Cu(I)-based oxides is discussed.

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  • Received 7 July 2009

DOI:https://doi.org/10.1103/PhysRevLett.103.096405

©2009 American Physical Society

Authors & Affiliations

David O. Scanlon*, Benjamin J. Morgan, and Graeme W. Watson

  • School of Chemistry, Trinity College Dublin, Dublin 2, Ireland

Aron Walsh

  • Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ, United Kingdom

  • *scanloda@tcd.ie
  • watsong@tcd.ie

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Issue

Vol. 103, Iss. 9 — 28 August 2009

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