Hole-mobility-limiting atomic structures in hydrogenated amorphous silicon

Eric Johlin, C. B. Simmons, Tonio Buonassisi, and Jeffrey C. Grossman
Phys. Rev. B 90, 104103 – Published 5 September 2014
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Abstract

Low hole mobility currently limits the efficiency of amorphous silicon photovoltaic devices. We explore three possible phenomena contributing to this low mobility: coordination defects, self-trapping ionization displacement defects, and lattice expansion allowing for hole wave-function delocalization. Through a confluence of experimental and first-principles investigations, we demonstrate the fluidity of the relative prevalence of these defects as film stress and hydrogen content are modified, and that the mobility of a film is governed by an interplay between various defect types.

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  • Received 28 March 2014
  • Revised 26 June 2014

DOI:https://doi.org/10.1103/PhysRevB.90.104103

©2014 American Physical Society

Authors & Affiliations

Eric Johlin*, C. B. Simmons, Tonio Buonassisi, and Jeffrey C. Grossman

  • Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA

  • *johlin@alum.mit.edu

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Issue

Vol. 90, Iss. 10 — 1 September 2014

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