Continuously tunable band gap in GaN/AlN (0001) superlattices via built-in electric field

X. Y. Cui, D. J. Carter, M. Fuchs, B. Delley, S. H. Wei, A. J. Freeman, and C. Stampfl
Phys. Rev. B 81, 155301 – Published 1 April 2010

Abstract

Based on all-electron density-functional theory calculations using the generalized gradient approximation, we demonstrate the continuous tunability of the band gap and strength of the built-in electric field in GaN/AlN (0001) superlattices by control of the thickness of both the well (GaN) and barrier (AlN) regions. The effects of strain for these quantities are also studied. Calculations taking into account the self-interaction correction exhibit the same dependence on thickness. The calculated electric field strength values are in good agreement with recent experiments. Spontaneous polarization dominates the contribution to the electric field and the strain-induced piezoelectric polarization is estimated to contribute only about 5–10%.

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  • Received 24 September 2009

DOI:https://doi.org/10.1103/PhysRevB.81.155301

©2010 American Physical Society

Authors & Affiliations

X. Y. Cui1, D. J. Carter1,2, M. Fuchs3, B. Delley4, S. H. Wei5, A. J. Freeman6, and C. Stampfl1

  • 1School of Physics, The University of Sydney, Sydney, New South Wales 2006, Australia
  • 2Nanochemistry Research Institute, Curtin University of Technology, Perth, Western Australia 6845, Australia
  • 3Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany
  • 4Paul Scherrer Institut, WHGA/123, CH-5232 Villigen PSI, Switzerland
  • 5National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401, USA
  • 6Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208-3112, USA

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Issue

Vol. 81, Iss. 15 — 15 April 2010

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