Dynamics of step fluctuations on a chemically heterogeneous surface of Al/Si(111)-(3×3)

I. Lyubinetsky, D. B. Dougherty, T. L. Einstein, and E. D. Williams
Phys. Rev. B 66, 085327 – Published 29 August 2002
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Abstract

The analysis of the dynamics of equilibrium step fluctuations has been extended to a chemically heterogeneous surface. The multicomponent reconstructed Al/Si(111)-(3×3) surface has been studied using variable-temperature scanning tunneling microscopy at elevated temperatures. The temporal correlation functions for both single steps and step arrays follow a t1/2 dependence over the entire temperature range (770–1020 K), consistent with a rate limiting mechanism of random attachment and detachment of atoms at step edges. The alternative mechanism, diffusion from step-to-step, is shown to be inconsistent with more detailed analytic approximations to the correlation function for the measured step-step separation. An activation energy of 1.9 eV and the major kinetic parameters that govern surface mass transport and step equilibration processes have been determined.

  • Received 14 December 2001

DOI:https://doi.org/10.1103/PhysRevB.66.085327

©2002 American Physical Society

Authors & Affiliations

I. Lyubinetsky, D. B. Dougherty, T. L. Einstein, and E. D. Williams*

  • University of Maryland, Department of Physics & MRSEC, College Park, Maryland 20742-4111

  • *Email address: edw@physics.umd.edu

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Vol. 66, Iss. 8 — 15 August 2002

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