Interface stability of Ti(SiGe)2 and SiGe alloys: Tie lines in the ternary equilibrium diagram

D. B. Aldrich, F. M. d’Heurle, D. E. Sayers, and R. J. Nemanich
Phys. Rev. B 53, 16279 – Published 15 June 1996
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Abstract

The C54 phases of TiSi2 and TiGe2 are known to be completely miscible, however, we have observed that thin films of C54 Ti(Si1yGey)2 are not stable in contact with Si1xGex when y=x. In this study it is shown that this interface instability can be related to the composition-dependent energetics that determine the Ti-Si-Ge ternary equilibrium diagram. Tie lines of the Ti(Si1yGey)2 to Si1xGex system were calculated on the basis of classical thermodynamics. The calculations indicate that for C54 Ti(Si1yGey)2 to be stable in contact with Si1xGexthe compositions of the two phases must be such that y<x. The specific compositions of the two phases in equilibrium depend on the temperature and the relative quantities of the two phases. The dynamics of the interface reactions of C54 Ti(Si1yGey)2 on Si1xGex are related to the calculated tie lines, and the diffusion kinetics of the materials. Experimental results are presented that quantitatively support the model calculations. © 1996 The American Physical Society.

  • Received 20 February 1996

DOI:https://doi.org/10.1103/PhysRevB.53.16279

©1996 American Physical Society

Authors & Affiliations

D. B. Aldrich

  • Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202

F. M. d’Heurle

  • IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

D. E. Sayers and R. J. Nemanich

  • Department of Physics, North Carolina State University, Raleigh, North Carolina 27695-8202

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Vol. 53, Iss. 24 — 15 June 1996

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